% sputtering yield : Ne -> B4C
% z1=10, m1= 20.18, z2= 5, 6, m2= 10.81, 12.01, sbe=6.06 eV, rho=2.51 g/cm**3
% ef=0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program: IPP 9/82
% only low fluence !
% ne= 7, na= 1
%                                                                               
%  e0     0     
#
# total yield
#
  100  8.10e-3
  300  1.09e-1
  500  1.98e-1
 1000  3.34e-1 
 2000  4.46e-1
 5000  5.40e-1
10000  5.41e-1