% sputtering yield : Ar -> Si
% z1=18, m1= 39.95, z2=14, m2= 28.09, sbe=4.70, rho=2.32 g/cm**3
% ef=0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program : trspvmcx, IPP 9/82
% ne=15, na= 1
%
%   e0     0  
%
    50  1.79e-3
    50  1.60e-3
   100  3.08e-2
   100  3.20e-2
   300  2.33e-1
   300  2.30e-1
   500  3.96e-1
   500  3.50e-1
  1000  6.64e-1
  1000  6.20e-1
  3000  9.50e-1
  4000  1.19e-0
 10000  1.20e-0
 30000  1.25e-0
100000  1.20e-0