% sputtering yield : Ar -> Ti % z1=18, m1= 39.95, z2=22, m2= 47.90, sbe=4.89 eV, rho=4.52 g/cm**3 % ef=0.20, 0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC) % program : trvmc95 % ne= 5, na= 5 % % e0 0 20 45 50 60 % 640 2.29e-0 1000 1.04e-0 1040 1.15e-0 2.14e-0 3.15e-0 1440 3.84e-0 5000 4.62e-0