% sputtering yield : He -> U
% z1= 2, m1=  4.00, z2=92, m2=238.03, sbe=5.42 eV, rho=19.07 g/cm**3
% ef=0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program : IPP 9/82
% ne=12, na= 1
%
%  e0      0  
%
   200  5.40e-3
   300  1.63e-2
   500  2.27e-2
  1000  4.45e-2
  3000  6.40e-2
  5000  6.54e-2
 10000  5.94e-2
 30000  4.57e-2
 50000  3.12e-2
 75000  2.59e-2
100000  2.09e-2
200000  1.26e-2