% sputtering yield : Kr -> U
% z1=36, m1= 83.80, z2=92, m2=238.03, sbe=5.42 eV, rho=19.07 g/cm**3
% ef=0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program : IPP 9/82
% ne=12, na=15
%
%  e0      0      15      20      30      45      50      55      60      65      70      75      80     82.5     85     87.5
%
    50  1.93e-2
   100  1.48e-1
   300  6.78e-1
  1000  1.70e-0
  3000  3.09e-0
 10000  4.67e-0
 17900  5.76e-0 5.88e-0 6.26e-0 6.97e-0 9.15e-0 1.01e+1 1.04e+1 1.11e+1 1.21e+1 1.23e+1 1.20e+1 1.05e+1 8.78e+0 5.96e+0 1.26e-0
 17930  5.47e-0
 30000  6.12e-0
100000  6.37e-0
300000  5.80e-0
500000  4.93e-0