% sputtering yield : Ne -> U
% z1=10, m1= 20.18, z2=92, m2=238.03, sbe=5.42 eV, rho=19.07 g/cm**3
% ef=0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program : IPP 9/82
% ne=13, na= 1
%
%  e0      0  
%
    50  7.30e-3
   100  7.56e-2
   300  2.96e-1
   500  4.26e-1
  1000  6.46e-1
  2000  8.72e-1
  3000  9.97e-1
  5000  1.17e-0
 10000  1.28e-0
 30000  1.34e-0
100000  9.68e-1
300000  5.84e-1
500000  5.12e-1