% sputtering yield : Rn -> U
% z1=86, m1=222.00, z2=92, m2=238.03, sbe=5.42 eV, rho=19.07 g/cm**3
% ef=0.50 eV, esb=0.00 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program : IPP 9/82
% ne=12, na= 1
%
%  e0      0  
%
    50  9.00e-4
    70  9.70e-3
   100  4.05e-2
   150  1.37e-1
   200  2.47e-1
   300  4.69e-1
  1000  1.62e-0
  3000  3.30e-0
 10000  5.85e-0
 30000  8.55e-0
100000  1.12e+1
300000  1.25e+1