% sputtering yield : U -> U
% z1=92, m1=238.03, z2=92, m2=238.03, sbe=5.42 eV, rho=19.07 g/cm**3
% ef=5.37 eV, esb=5.42 eV, ca=1.00, kk0=kk0r=2, kdee1=kdee2=3, ipot=ipotr=1 (KrC)
% program : IPP 9/82
% ne=11, na= 1
%
%  e0      0  
%
    70  1.32e-2
   100  4.84e-2
   150  1.38e-1
   200  2.58e-1
   300  4.60e-1
   500  8.84e-1
  1000  1.64e-0
  3000  3.35e-0
 10000  6.06e-0
 30000  8.50e-0
100000  1.14e+1