**Contents and Representation of Data**

For most projectile - target combinations five kinds of numerical data are provided.

- Sputtering yield (Y)
- number of sputtered atoms per projectile
- Sputtered energy (Y
_{E}) - mean energy taken away by sputtered atoms per projectile energy
- Particle reflection coefficients (R
_{N}) - fraction of backscattered projectiles (not implanted or transmitted)
- Energy reflection coefficients (R
_{E}) - fraction of the incident energy carried by reflected projectiles
- Mean range
- average depths (10
^{-10}m) of implanted atoms

For some combinations, particle and energy transmission coefficients (T_{N} and T_{E}, respectively) are provided.

The mean energies of sputtered and reflected particles (E_{sp} and E_{b}, respectively) are given in general as the first moments of the sputtered
and reflected energy distributions, respectively. Only for a given set
of the energy (E_{0}) and the angle of incidence, the mean energies of the sputtered and reflected
particles are expressed simply as,

E_{sp}=E_{0}Y_{E}/Y and E_{b}=E_{0}R_{E}/R_{N}, respectively.

Each kind of numerical data is presented in a separate table. The table
is arranged in such a way that **lines give an angular dependence of sputtering yields at a fixed incident
energy, and columns give an energy dependence at a fixed angle of incidence.** In special cases, this arrangement may be changed. For instance, in the case of the Maxwellian distribution of incidence,
each line gives all of Y, Y_{E}, E_{sp}, R_{N}, R_{E}, E_{b}, and the mean range for a given ion temperature (kT in eV), and the data
obtained using different types of the sheath potential (Vsh) are provided
in separate tables. **Abbreviations used in the tabels are listed HERE.**

*Copyright (c) 2003 National Institute for Fusion Science*